ITO thin films were grown on PC(polycarbonate), PMMA(polymethyl methacrylate)and glass substrates by r.f. magnetron sputtering. The electrical, structural and chemical characteristics of ITO films were analyzed by the Hall Technique, X-ray diffraction, and X-ray photoelectron spec-troscopy. XPS studies suggest that all the ITO films consist of crystalline and amorphous phases. The degree of crystallinity increases from less than 45% to more than 90% when the substrate temperature increases from 80 to 300 ℃.The In and Sn exist in the chemical state of In3+ and Sn4+, respectively,independent of substrate type and temperature. The enrichment of Sn on surface and In in body of ITO films are also revealed. And, the oxygen deficient regions exist both in surface layer and film body. For ITO films deposited under 180 ℃, the carrier concentration are mainly provided by oxygen vacancies,and the dominant electron carrier scattering mechanism is grain boundary scattering between the crystal and the amorphous grain. For ITO films deposited over 180 ℃, the carrier concentration are provided by tin doping, and the dominant scattering mechanism transforms from grain boundary scattering between the crystal grains to ionized impurity scattering with increasing deposition tem-perature.
参考文献
| [1] | LIU Jing;GONG Jian;GU Zhen'an .Preparation of Indium Tin Oxide Films on Polycarbonate Substrates by Radio-frequency Magnetron Sputtering[J].Journal of Wuhan University of Technology.Materials Science edition,2005(4):22-25. |
| [2] | C. Guillen;J. Herrero .Electrical contacts on polyimide substrates for flexible thin film photovoltaic devices[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(5):403-406. |
| [3] | Kim D. .Deposition of indium tin oxide films on polycarbonate substrates by direct metal ion beam deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2003(1/4):70-77. |
| [4] | Jun SI;McKnight TE;Simpson ML;Rack PD .A statistical parameter study of indium tin oxide thin films deposited by radio-frequency sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2005(1):59-64. |
| [5] | Jow-Lay Huang;Yin-Tsan Jah;Bao-Shun Yau;Ching-Yun Chen;Horng-Hwa Lu .Reactive magnetron sputtering of indium tin oxide films on acrylics morphology and bonding state[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(1/2):33-37. |
| [6] | Hiroshi Morikawa;Miya Fujita .Crystallization and decrease in resistivity on heat treatment of amorphous indium tin oxide thin films prepared by d.c. magnetron sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(12):309-313. |
| [7] | Stoev MD.;Tousek J.;Touskova J. .X-RAY PHOTOELECTRON SPECTROSCOPY, SCANNING ELECTRON MICROSCOPY AND OPTICAL TRANSMITTANCE STUDIES OF INDIUM TIN OXIDE AND CADMIUM SULPHIDE THIN FILMS FOR SOLAR CELLS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):67-71. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%