A series ofphosphorylation and blank CeSn0.8W0.6Ox/TiAl0.2Si0.1Oycatalystsprepared byextrusion molding were tested for NH3-SCR ofNO, and were characterized by techniques ofX-ray diffraction (XRD),Brumauer-Emmett-Teller(N2-BET),envi-ronmental scanning electron microscope(ESEM),temperature programmed reduction(H2-TPR)andtemperature programmed desorp-tion(NH3-TPD). Effects ofphosphorylation on catalytic activity and sulfur-resisting performance of the CeSn0.8W0.6Ox/TiAl0.2Si0.1Oy for NH3-SCR of NO were mainly studied. Results showed that the phosphorylation improved the catalytic activity and sulfur-resisting performance in anactive temperature window of300–440°C, and thephosphorylationcatalyst with 0.4wt.% H3PO4exhibited the best catalytic performance and the strongestsulfur-resisting performance. Analysis showed that the phosphorylation increased specif-ic surface area, enhanced the surface acidity and improved redox properties.
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