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This paper presents a novel method to fabricate separated macroporous silicon using a single step of photo-assisted electrochemical etching.The method is applied to fabricate silicon microchannel plates in 100 mm p-type silicon wafers,which can be used as electron multipliers and three-dimensional Li-ion microbatteries.Increasing the backside illumination intensity and decreasing the bias simultaneously can generate additional holes during the electrochemical etching which will create lateral etching at the pore tips.In this way the silicon microchannel can be separated from the substrate when the desired depth is reached,then it can be cut into the desired shape by using a laser cutting machine.Also,the mechanism of lateral etching is proposed.

参考文献

[1] Wiza J L.Microchannel plate detectors.Nuclear Instruments and Methods,1979,162:587
[2] Golodnitsky D,Nathan M,Yufit V,et al.Progress in threedimensional (3D) Li-ion microbatteries.Journal of Power Sources,2006,153:281
[3] Beetz C P,Boerstler R,Steinbeck J,et al.Silicon-micromachined microchannel plates.Nuclear Instruments and Methods in Physics Research A,2000,442:443
[4] Beetz C P,Boerstler R,Steinbeck J,et al.Silicon etching process for making microchannel plates.USA Patent,No.5997713,1999
[5] Ohji H,Trimp P J,French P J.Fabrication of free standing structure using single step electrochemical etching in hydrofluoric acid.Sensors and Actuators,1999,73:95
[6] Chao K J,Kao Z S C,Yang C M,etal.Formation of high aspect ratio macropore array on p-type silicon.Electrochem Solid-State Lett,2000,3(10):489
[7] Pagonis D N,Nassiopoulou A G.Free-standing macroporous silicon membranes over a large cavity for filtering and lab-on-chip applications.Microelectron Eng,2006,83:1421
[8] Duan Ding,Ci Pengliang,Tian Fei,et al.Large-size P-type silicon microchannel plates prepared by photoelectrochemical etching.J Micro/Nanolit MEMS MOEMS,2009,8(3):033012
[9] Chen X M,Lin J L,Yuan D,et al.Obtaining a high area ratio free-standing silicon microchannel plate via a modified electrochemical procedure.J Micromeehan Microeng,2008,18:037003
[10] Bettotti P,Gaburro Z,Negro L D,et al.New progress on p-type macroporous silicon eleetrodissolution.Mat Res Soc Symp Proc,2002,722:L6.7.1
[11] Ohji H,Izuo S,French P J,et al.Macroporous-based micromachining on full wafers.Sensors and Actuators A,2001,92:384
[12] F(O)ll H,Christophersen M,Carstensen J,et al.Formation and application of porous silicon.Mater Sci Eng R,2002,39:93
[13] Lehmann V.Electrochemistry of silicon.Weinheim:Wiley-VCH,2002
[14] Smith R L,Collins S D.Porous silicon formation mechanisms.J Appl Phys,1992,71(8):R1
[15] Lehmann V,R(o)nnebeck S.The physics of macropore formation in low-doped p-type silicon.J Electrochem Soc,1999,146(8):2971
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