目前大量使用的钌靶主要用粉末冶金方法制备，所用原料为高纯钌粉。粉末质量是影响钌靶制备和使用性能的关键问题。基于文献和实验，详细列出了高纯钌粉在纯度、尺寸等方面的具体特征，给出了高纯钌粉的具体指标和要求。系统概述了高纯钌粉的主要制备工艺路线和流程(包括物料预处理、氧化溶解、氧化蒸馏、吸收浓缩、沉淀结晶、煅烧分解、还原制粉)，以及各过程中的主要原理、工艺步骤和加工方法。在此基础上，系统总结和归纳了目前国内外主要厂家和研究机构的主要生产工艺和流程，并对其制备方法、工艺路线及特点进行了分析和讨论。在研究制备原理和工艺的基础上发现控制杂质含量的基本原则，即通过多次反复四氧化钌的氧化蒸馏和吸收这一过程可降低杂质阳离子含量，而通过煅烧、氢气还原、真空处理等可以有效去除杂质阴离子，根据钌粉中超标的离子种类，就可确定需要改进的工艺环节和步骤。分析了热等静压、放电等离子烧结和真空热压等方法制备钌靶时，所需钌粉在纯度和晶粒尺寸方面的具体要求，以及钌粉末的晶粒尺寸和形貌对靶材的机械加工性能、溅射性能的影响。最后给出了高纯钌粉制备技术方面急待解决的重要问题和发展方向。
The ruthenium sputtering targets are mainly fabricated from high purity ruthenium powder by pow-der metallurgy method.The Ru powder determines the preparation and performance of ruthenium target.Based on the literature and experiments,specific characteristics such as purity,size,and other requirements of Ru powder are listed in detail.The main preparation technology and processes of the ruthenium powder including material pretreatment, oxidation dissolution,oxidation distillation,absorption concentration,precipitation crystallization,calcining decompo-sition,reduction pulverizing,are presented.The main principle,process steps and techniques for the processing are listed respectively.For the manufacturers and research institutes,the main production technologies of high purity ru-thenium powder and process,and its preparation methods,process routes and characteristics are analyzed and dis-cussed.It has been found that repeated ruthenium tetroxide (RuO4 )distillation and absorption of the process can re-duce the impurity content of cationic,and calcination,hydrogen reduction,vacuum treatment can effectively remove impurities such as anions.According to excessive amounts of ionic species in ruthenium powder,the process and steps in need of improvement could be determined.The high purity ruthenium powder in terms of purity and grain size of the specific requirements for preparation method of ruthenium target,including the hot isostatic pressing,spark plas-ma sintering and vacuum hot pressing method,are analyzed.The influences of Ru particles size and morphology on mechanical processing performance and sputtering performance of Ru target are surveyed.Finally,the important prob-lems and solutions for high purity ruthenium powder preparation technology as well as development directions are all listed.
参考文献
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%