通过原子层沉积(ALD)技术以三甲基铝和水作为前驱体在二硝酰胺铵(ADN)表面沉积氧化铝包覆膜。分别采用扫描电子显微镜(SEM), X射线光电子能谱(XPS)对包覆后ADN的表面形貌、化学成分进行了分析,通过蒸汽吸附分析仪(VSA)对包覆氧化铝薄膜的ADN样品进行了吸湿性测试,并且对ADN表面氧化铝薄膜生成机理进行了探讨。结果表明：ALD氧化铝薄膜对ADN表面形成了完整的包覆,薄膜厚度最高可达数百纳米。包覆有ALD氧化铝薄膜的ADN样品暴露在潮湿空气中48 h形貌不发生明显变化。在25℃,湿度70%的环境条件下, VSA测得包覆200和400周期氧化铝薄膜的ADN吸湿率分别为40.99%和40.75%。以上研究结果表明,尽管ALD氧化铝对ADN表面实现了完整包覆并在潮湿空气中维持了样品形貌,被包覆的ADN样品吸湿性尚未获得明显改善。
To deposit alumina thin films on ammonium dinitramide (ADN) by atomic layer deposition (ALD), trimethylaluminum and water were used as the precursors. The surface morphology and chemical compositions of the ALD alumina coated ADN were characterized by scanning electron microscope (SEM) and X-ray photoelectron spec-troscope (XPS). The hygroscopic property of the ALD alumina coated ADN was studied by a vapor adsorption ana-lyzer (VSA). The possible mechanism of ALD alumina film growth on the surface of ADN was discussed. The charac-terization results indicate that the ALD alumina film completely covers the surface of ADN. The thickness of the alu-mina film can reach hundreds of nanometers. After 48 h of air exposure, the shapes and topologies of the alumina coated ADN particles are maintained. The hygroscopicity of the ADN samples coated by 200 and 400 cycles of ALD alumina are 40.99%and 40.75%, respectively. Although the ALD alumina coating completely covers the surface of ADN and successfully maintains the shapes and topologies of ADN particles in a wet environment, the hygroscopicity of the ALD alumina coated ADN is not improved.
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