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  4. 复合高功率脉冲磁控溅射技术的研究进展

表面技术 , 2016, 45(6): 82-90. doi: 10.16490/j.cnki.issn.1001-3660.2016.06.013

复合高功率脉冲磁控溅射技术的研究进展

李春伟 1, , 苗红涛 2, , 徐淑艳 3, , 张群利 4,

1.东北林业大学工程技术学院,哈尔滨150040;东北林业大学林业工程博士后流动站,哈尔滨150040

2.河南牧业经济学院包装与印刷工程学院,郑州,450046

3.东北林业大学工程技术学院,哈尔滨,150040

4.东北林业大学工程技术学院,哈尔滨,150040

基金项目:   中国博士后科学基金项目资助(2016M590273)   黑龙江省教育厅科学技术研究项目资助(12523008)Supported by the Fundamental Research Funds for the Central Universities (2572015CB07)   中央高校基本科研业务费专项资金项目资助(2572015CB07)   The Scientific Research Fund of Heilongjiang Provincial Education Department (12523008)   The China Postdoctoral Science Foundation (2016M590273)   The Science Foundation of Heilongjiang Province of China (QC2016053)   黑龙江省科学基金项目资助(QC2016053)  

关键词： 高功率脉冲磁控溅射 , 高离化率 , 物理气相沉积 , 辅助装置

Research Progress of Hybrid High Power Impulse Magnetron Sputtering

Keywords： high power impulse magnetron sputtering , high ionized fraction , physical vapor deposition , auxiliary device

高功率脉冲磁控溅射技术(HIPIMS)是一门新兴的高离化率磁控溅射技术.概述了HIPIMS的技术优势,包括高膜层致密度和平滑度、高膜基界面结合强度以及复杂形状工件表面膜层厚度均匀性好等.同时归纳了HIPIMS存在的问题,包括沉积速率及低溅射率金属靶材离化率低等.在此基础上,重点综述了近年来复合HIPIMS技术的研究进展,其中复合其他物理气相沉积技术的HIPIMS,包括复合直流磁控溅射增强HIPIMS、复合射频磁控溅射增强HIPIMS、复合中频磁控溅射增强HIPIMS、复合等离子体源离子注入与沉积增强HIPIMS等;增加辅助设备或装置的HIPIMS,包括增加感应耦合等离子体装置增强HIPIMS、增加电子回旋共振装置增强HIPIMS,以及增加外部磁场增强HIPIMS等.针对各种形式的复合HIPIMS技术,分别从复合HIPIMS技术的放电行为、离子输运特性,及制备膜层的结构与性能等方面进行了归纳.最后展望了复合HIPIMS技术的发展方向.

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