采用电子通道衬度技术对垂直晶界Cu双晶在疲劳过程中位错组态的演化与裂纹的形核进行了研究.结果表明,形变带中墙结构的间距从形成之初到疲劳裂纹出现始终保持恒定;穿晶裂纹与沿晶裂纹尖端的位错组态均为胞结构;裂纹优先从形变带产生.
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