电子封装无Pb化进程中,对无Pb钎料可焊性镀层技术的发展和应用提出了要求.本文给出一种碱性焦磷酸盐镀液及其电沉积工艺,以获得Sn-Ag无Pb焊料的可焊性镀层.研究了镀液中的主盐浓度、电流密度、镀液温度及搅拌等工艺条件对镀层中Ag含量及镀层表面形貌的影响.
参考文献
[1] | Tu Z M,Zhang J S,Yang Z L.Mater Prot,2001,34(8):1(屠振密,张景双,杨哲龙.材料保护,2001,34(8):1) |
[2] | Arai S, Watanabe T. Mater Trans JIM, 1998, 39(4): 439 |
[3] | Futiwara Y, Yarmizu Y, Enomoto H, Narahara T, Funada K. J Jpn Inst Met, 1999, 50(12): 1173 |
[4] | Cai J Q. Electroplat Pollut Control, 2002, 22(3): 8(蔡积庆.电镀与环保,2002,22(3):8) |
[5] | Wang L L.Plat Finish,1999,21(4):42(王丽丽.电镀与精饰,1999,21(4):42) |
[6] | Wang L L. Plat Finish,1997,19(2):44(王丽丽.电镀与精饰,1997,19(2):44) |
[7] | Nawafune H, Shiba K, Mizumoto S, Takeuchi T, Aoki K.J Jpn Inst Met, 2000, 51(12): 1234 |
[8] | Nawafune H, Shiba K, Kitamura H, Mizumoto S, Takeuchi T, Aoki K. J Jpn Inst Met, 1998, 49(7): 759 |
[9] | Kondo T, Obata K, Takeuchi T, Masaki S. Plat Surf Finish, 1998, 2:51-55 |
[10] | Xiao Y J. Electroplat Finish, 2001, 20(4): 20(肖友军.电镀与涂饰,2001,20(4):20) |
[11] | Thaddeus B M. Binary Alloy Phases Diagrams, Ohio:William W. Scott, Jr. 1990:96 |
[12] | Huang Z X. Practical Electroplating Technique, Beijing:Chemical Industry Press, 2002:165(黄子勋.实用电镀技术,北京:化学工业出版社,2002:165) |
[13] | Huang Z X, Wu C S. Principles of Electroplating, Beijing:China Agriculture Press, 1982:57(黄子勋,吴纯素.电镀原理,北京:中国农业出版社,1982:57) |
[14] | Sriveeraraghavan S, Krishnan R M, Natarajan S R. Met Fin, 1989, 87(5-6): 115 |
[15] | Yin Y J. University Chemistery Handbook, Jinan: Shandong Science and Technology Press, 1985:320(印永嘉.大学化学手册,济南:山东科学技术出版社,1985:320) |
[16] | Tu Z M. Principles and Technologyof Alloy Electroplating, Beijing: National Defense Industry Press, 1993, 57(屠振密.电镀合金原理与工艺,北京:国防工业出版社,1993,57) |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%