采用动电位极化和交流阻抗谱技术(EIS)研究了(Cu47Zr11Ti34Ni8)100-x Mox(x=0,2)块体非晶合金在1mol/L H2SO4溶液中的室温电化学行为.结果表明,x=2的钝化膜破裂电位(Eb)显著上升,致钝化电位(E0)与维钝电流密度(ip)明显减小.这主要是由于在稳定的钝化区内,微量Mo的添加增加了基体合金中的"氧空位"和表面活性,抑制了阴离子空位在金属/表面膜(M/F)界面上的形成,促使元素Zr和Ti在M/F界面上快速形成相应的氧化物,并增加了钝化层中氧化层的厚度和稳定性.根据该体系在电解质中的电化学反应,基于点缺陷模型(PDM)建立了简单的动力学模型.利用该模型,结合EIS数据,分析了微合金化提高铜基块体非晶合金耐蚀性能的机理.
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