采用脉冲激光沉积(PLD)方法在镀Pt的Si衬底上制备了LiCoO2薄膜,运用XRD、Raman光谱、SEM和循环伏安等方法对其结构与电化学性能进行表征,在此基础上着重采用电位间歇滴定技术(PITT)对其Li离子表观扩散进行了分析.结果表明,600 ℃制备的LiCoO2薄膜为HT-LiCoO2相,呈柱状晶结构,平均晶粒尺寸在100 nm以下,结晶度高,并且具有明显的[001]择优取向,但少量缺Li.伏安循环曲线表明,该LiCoO2薄膜具有良好的电化学可逆性,但只在3.9 V(vs Li/Li+)附近出现一对氧化还原峰.PITT测试表明,PLD方法制备的HT-LiCoO2薄膜的Li离子扩散系数在10-8-10-9cm2/s,与其它方法(如射频磁控溅射)制备的HT-LiCoO2薄膜相比,扩散系数高1-2个数量级;并且PLD方法制备的HT-LiCoO2薄膜中Li离子扩散系数与相变有关,在两相共存区,由于相界钉扎的作用,Li离子扩散系数比其它区域小1-2个数量级.
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