首先采用溶胶-凝胶法在Al2O3基体上制备了TiO2纳米晶薄膜,然后在管式气氛炉中,用氨气作为还原剂,直接氮化制备TiO2纳米晶薄膜;从而成功地在α-Al2O3陶瓷基片上制备了纳米晶TiN薄膜.利用XRD、XPS、FE-SEM等分析技术,研究了制备的纳米晶TiN薄膜的相组成及形貌.结果表明最佳工艺条件为:氮化温度为700℃,氮化时间为1h.
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