采用金属有机化学气相沉积(MOCVD)方法,由NO和N2O混合气体在玻璃衬底上沉积了p型ZnO薄膜.NO和N2O流量分别为40和25 sccm时,得到最低电阻率5.52Ω·cm,同时样品的空穴浓度最高,为2.17×1018cm-3,电性能的稳定性也最好.全部样品放置四个月后仍为p型,但电阻率增大.
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