以SiCl4-NH3-H2为反应体系,采用化学气相渗透法CVI)制备C/Si3N4复合材料.渗透产物的能谱和X射线衍射表明渗透产物为非晶态Si3N4,经1350℃真空热处理后,产物仍然为非晶态Si3N4;经1450℃真空热处理后,产物已经发生晶型转变,由非晶态转变为晶态的α-Si3N4和β-Si3N4.渗透温度、渗透时间、气体流量对试样致密化、增重及微观结构的影响研究表明渗透温度为900℃、SiCl4流量为30mL/min、H2流量为100mL/min、NH3流量为80mL/min、渗透时间120h、系统压力1000Pa时,气体渗透进入碳布预制体后,在预制体内反应均匀,制备的复合材料较均匀.
参考文献
[1] | Imuta M, Gotoh J. Key Engineering Materials, 1999, 164-165: 439-444. |
[2] | Hideki Hyuga, Mark I Jones, Kiyoshi Hirao, et al. Journal of the European Ceramic Society, 2004, 24 (5):877-885. |
[3] | Bhatt Ramakrishna T, Phillips Ronald E. Journal of Composites Technology & Research, 1990, 12 (1): 13-23. |
[4] | Delhaes P. Carbon, 2002, 40 (5): 641-657. |
[5] | Xiao P, Xu Y D, Zhang L T, et al. Materials Science and Engineering A, 2001, 313 (1): 244-250. |
[6] | Naslain R R, Pailler R, Bourrat X, et al. Solid State Ionics, 2001, 141-142: 541-548. |
[7] | Hoyt Joel T, Yang J M. SAMPE Journal, 1991, 27 (2): 11-17. |
[8] | Richard D Veltri, Francis S Galasso. Journal of the American Ceramic Society, 1990, 73 (7): 2137-2140. |
[9] | Grieco M J, Worthing F L, Schwartz B. J. Electrochem. Soc. Solid State Science, 1968, 115: 525-531. |
[10] | Niihara Koichi HiraiToshio. Journal of Materials Science, 1976, 11 (4): 604-611. |
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