用电共沉积方法制备出4种InGaAs薄膜,用能谱析仪分析了薄膜成分,用分光光度计和单色仪测量薄膜的透射率结果表明,InxGa1-xAs薄膜为多晶结构,晶粒尺寸约为0.25μm,晶粒细致、均匀,其V-I特性是线性的,随着Ga含量的减少,发光波长增大.InGaAs薄膜的发射光波长为1.3~1.5μm.
参考文献
[1] | 王贤仁,董志武,戴国瑞,光电子材料及应用的某些进展(长春,吉林大学出版社,1989)p.11(WANG Xianren, DONG Zhiwu, DAI Guorui, Optoelectronic Materials and Its Applicationsz (in Chinese)[M]. Changchun: Press of Jilin University. 1989, p.11) |
[2] | [日]御子柴宣夫著,袁健畴译,电子材料(北京,电子工业出版社,1988)p.170(Mikoshida Noduo. Electronic Materials (in Chinese)[M]. Beijing: Press of Electronic Industry. 1988, p.170) |
[3] | 曲喜新,杨邦朝,姜节俭,张怀武,电子薄膜材料(北京,科学出版社、1996)p.163(QU Xixin, YANG Bangchao, JIANG Jiejian, ZHANG Huaiwu, Materials of Electronic Film (in Chinese)[M]. Beijing: Science Press. 1996, p.163) |
[4] | 黄德秀,任重远,电子材料物理化学(上海,上海科技出版社,1986)p.171(HUANG Dexiu, REN Zhongyuan, Physical Chemistry of Electronic Materials (in Chinese) [M]. Shanghai: Science and Technology Press. 1986, p.171) |
[5] | S.Chandra, Neerajkhare, Semicond.Sci. Technol., 2, 180(1987) |
[6] | 黄德修,半导体光电子学(成都,电子科技大学出版社,1994)p.(HUANG Dexiu, Optoelectronics of Semiconductors (in Chinese) [M]. Chengdu: Press of Electronic Scienceand Technology University, 1994, p.49) |
[7] | 杜经宁,J.W.迈耶,L.C.德曼著,黄信凡,杜家方,陈坤基译,电子薄膜科学(北京,科学出版社,1997)p 185(DU Jingning, J.W.Maiye, L.C.Deman. Interpreter: Huang Xinfan, Du Jiafang, Chen Kunji. Science of Electronic Film (in Chinese) [M]. Beijing: Science Press, 1997, p.185) |
[8] | 刘恩科,光电池与应用(北京,科学出版社,1989)p.5(LIU Enke, Solar Cell and Its Application (in Chinese) [M]. Beijing: Science Press, 1989, p.5) |
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