采用直流反应溅射工艺制备了氧化铌(Nb2O5)薄膜,用XRD、AFM、AES和循环伏安等测试手段分析并研究了薄膜的组成、结构、表面形貌和电致变色性能间的关系.结果表明:在基底加热条件下可获得晶态TT-Nb2O5薄膜,沉积气压较高时的薄膜具有沿(100)面定向生长、结构相对较为疏松的柱状结构,这种薄膜具有良好的电化学稳定性,锂离子注入/抽出可逆性好,并具有灰色变色特性,在可见区(波长600 nm)的透过率调制幅度为35%.
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