对压痕诱发脆性材料塑性、损伤与断裂研究进行总结, 并结合与之有关学科研究进展予以评述. 主要结果:微压痕诱导硅和砷化镓晶体的纳米和非晶转变, 并发现这一转变的临界应力;转变过程是由切应力, 并非静水压力控制;电子辐照诱导非晶晶化, 并发现晶化临界条件;晶化速率与电流密度有关;压痕诱发的裂纹尖端不是原子尖的, 其萌生与扩展伴随位错的产生, 并由此引发点阵的畸变, 并产生1～2nm宽非晶带;裂纹扩展沿非晶带发生, 而非裂端前方原子键相继断裂的结果;经傅立叶变换和逆变换发现, 裂纹尖端变形显示出各向异性.
Investigations of the plasticity, damage and fracture induced by micro-indentation are reviewed. The principal findings are: (a) Micro-indentation may induce a transition from crystalline to nano-crystalline and amorphous structure, and there is a critical stress for this kind of transition. The shear stress, rather than the hydrostatic stress is proposed to be attributed to this transition. (b) There is a critical current density for the crystalline nucleation, and it is no related to the irradiation-induced temperature rise. (c) The crack-tip produced dislocations by during indentation is not atomically sharp, leading to crystal lattice distortion, and even to a transition from a crystalline lattice to disordered structure. An amorphous band with a width of 1-2nm between crack-walls is formed, and the crack propagation is then along the amorphous band, rather than sequential rupture of the cohesive bonds. (d) Fast Fourier Transformation (FFT)-SAED and corresponding Inverse-Fast Fourier Transformation (IFFT) fringe images from different lattice planes in selected areas of the crack-tip show that deformation around the crack-tip deformation is anisotropic.
参考文献
| [1] | Hertz Heinrich.J.Reine Angew Mach.,1881,92:156. |
| [2] | Tabor D.Hardness of metals,Oxford:Clarendon Press,1951. |
| [3] | Mott B W.Micro-Indentation Hardness Testing,London:Butterworths,1956. |
| [4] | Pethica J B,Hutchings R,Oliver W C.Phil.Mag.A,1983,48(6):593-606. |
| [5] | Johansson S,Schweitz J A.J.Am.Ceram.Soc.,1988,71(8):617-623. |
| [6] | Hische P B,Pirouz P.Phil.Mag.B,1985,52(3):759-784. |
| [7] | Bourhis E L,Ririere J P.J.Mater.Sci.,1996,31(24):6571-6576. |
| [8] | Gerberich W W,Nelson J C.Acta Mater.,1996,44(9):3585-3598. |
| [9] | Lawn B,Fuller E R.J.Mater.Sci.,1975,10(12):1049-1081. |
| [10] | Hockey B J.J.Am.Cerem.Soc.,1971,54(5):223-231. |
| [11] | Cook R F,Pharr G M.J.Mater.Ceram.Soc.,1990,73(4):787-817. |
| [12] | 吴亚桥.压痕下硅的结构演变及α-Fe/Nd_2Fe_(14)B基弹簧纳米永磁材料的结构特征.沈阳:中国科学院金属研究所博士论文,2000. |
| [13] | 李志成.压痕下GaAs单晶结构演变的微观研究.沈阳:中国科学院金属研究所博士论文,2002. |
| [14] | Warren P D,Pirouz P,Roberts S G.Phil.Mag.A,1984,50(5):L23-L28. |
| [15] | Choi S K,Mihara M,Ninomira T.J.Appl.Phys.,1978,17(2):329-335. |
| [16] | Roberts G,Warren P D,Hirsch P B.J.Phys.,Paris.,1986,44:C4-75. |
| [17] | 李井润,李志成,刘路,等.材料研究学报,2003,17(4):359-364. |
| [18] | Venables J A.Phil.Mag.,1961,6(63):379-396. |
| [19] | Mahajan S,Chin G Y.Acta Mater.,1973,21(10):1353-1363. |
| [20] | Lefebvre A,Vanderschaeve G.Phys.Sta.Sol.(a),1988,107(2):647-653. |
| [21] | Minomura S,Drickamer H D.J.Phys.,1963,23(15):451-462. |
| [22] | Lefebvre A,Androussi Y,Vanderschaeve G.Phys.Sta.Sol.(a),1987,99(2):405-412. |
| [23] | Gridneva I V,Milman Y V,Trefilov V I.Phys.Stat.Sol.(a),1972,14(1):177-182. |
| [24] | Gerk A P,Tabor D.Nature,1978,271(5647):732-733. |
| [25] | Wentorf R H,Kasper J S.Science,1963,39(3552):338-339. |
| [26] | Susuki T,Ohmura T.Phil.Mag.A,1996,74(5):1073-1084. |
| [27] | Clarke D R,Kroll M C.Phys.Rev.Lett.,1988,60(21):2156-2159. |
| [28] | Wu Y Q,Xu Y B.J.Mater.Res.,1999,14(3):682-687. |
| [29] | Wu Y Q,Xu T B.J.Mater.Res.,1999,14(6):2399-2401. |
| [30] | Lawn B R,Hockey B J.J.Mater.Sci.,1980,15(5):1207-1223. |
| [31] | Jamieson J C.Science,1963,139(3556):762-764. |
| [32] | Huang J Y,Yasuda H,Mori H.Phil.Mag.Lett.,1999,79(6):305-314. |
| [33] | Li Z C,Xu Y B.J.Mater.Res.,2001,16(10):2845-2849. |
| [34] | Besson J M,Itie J P.Phys.Rev.B,1991,44(9):4214-4234. |
| [35] | Lulli G,Merli P G,Antisari V.Phys.Rev.B,1987,36(15):8038.-8042. |
| [36] | Lulli G,Merli P G.Phys.Rev.B,1993,47(15):14023-14031. |
| [37] | Zinkle S J.J.Nucl.Mater.,1995,219:113-116. |
| [38] | Li Z C,Zhang H,Xu Y B.Mater.Sci.in Semicoductor Processing,2004,7:19-25. |
| [39] | Jenc^ic^ I,Robertson I M.J.Mater.Res.,1996,11(9):2152-2157. |
| [40] | Spaepen F,Turnbull D.Laser Annealing of Semiconductors,edited by J.M.Poate and J.W.Mayer,New York:Academic,1982. |
| [41] | Narayan J,Naramoto H,Whire C W.J.Appl.Phys.,1982,53(2):912-915. |
| [42] | Liu M,Xu L Y,Lin X Z.Scanning,1994,16(1):1-5. |
| [43] | Meldrum A,Boatner L A,Ewing R C.J.Mater.Res.,1997,12(7):1816-1827. |
| [44] | Sutton M,Yang Y S,Mainville J,et al.Phys.Rev.Lett.,1989,62(3):288-291. |
| [45] | Inglis C E.Trans.Intsi.Naval.Archit.,1913,55:219-230. |
| [46] | Griffith A A.Phil.Trans.R.Soc.,1920,A221:163-198. |
| [47] | Xu Y B,Li Z C,Zhang H.Phil.Mag.Lett.,2008,88(1):19-26. |
| [48] | St John C.Phil.Mag.,1975,32(6):1193-1212. |
| [49] | Michot G,George A.Script Matell.,1986,20(10):1495-1500. |
| [50] | Davidson D L,Lankford J.Int.Mater.Rev.,1992,37(2):45-76. |
| [51] | Wiederhorn S M,Hockey B J,Roberts D E.Phil.Mag.,1973,28(4):783-796. |
| [52] | Hockey B J,Lawn B R.J.Mater.Res.,1975,10(6):1275-1284. |
| [53] | Johansson S,Schweitz J A.J.Am.Ceram.Soc.,1988,71(1):617. |
| [54] | Saka H,Nagaya N.Phil.Mag.Lett.,1995,72(4):251-256. |
| [55] | Tanaka H,Bando Y,Inomata Y,et al.J.Am.Ceram.Soc.,1988,71(1):C32-C33. |
| [56] | Tanaka H,Bando Y.J.Am.Ceram.Soc.,1990,73(3):761-763. |
| [57] | Thomson R,Hseih C,Rana V.J.Appl.Phys.,1970,42:3154-3160. |
| [58] | Thomson R.J.Mater.Sci.,1978,13(1):128-142. |
| [59] | Barenblett G I.Advances in Applied Mechanics,ed.Pryden H L,Harman T.New York:Academic Press,1962:327. |
| [60] | Wu Y Q,Xu Y B.Phil.Mag.Lett.,1998,78(1):9-13. |
| [61] | Wu Y Q,Yang X Y,Xu Y B.Acta Metall.,1999,47(8):2431-2436. |
| [62] | Li Z C,Xu Y B.Phil.Mag.Lett.,2003,83(4):217-221. |
| [63] | Wiederhorn S M.Ann.Rev.Mater.Sci.,1984,14:373-403. |
| [64] | Lawn B R.J.American Ceramic Society,1983,66(1):83-91. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%