沉积激光能量对CuAlO2薄膜光学性质的影响

无机材料学报, 2011, 26(3): 281-284. doi: 10.3724/SP.J.1077.2011.00281

沉积激光能量对CuAlO2薄膜光学性质的影响

邓赞红 ^1, , 方晓东 ^2, , 陶汝华 ^3, , 董伟伟 ^4, , 周曙 ^5, , 孟钢 ^6, , 邵景珍 ^7,

基金项目: 中国科学院合肥物质科学研究院知识创新工程青年人才领域前沿项目安徽省自然科学基金(090414169)

Effect of Deposition Laser Energy on the Optical Properties of CuAlO2 Films

采用脉冲激光沉积法制备了CuAlO2薄膜.在沉积激光能量100～180mJ范围内原位沉积的薄膜并在N2气氛下900℃异位退火1h处理后,所有薄膜均为高度c轴取向的单相CuAlO2薄膜,晶粒尺寸～49nm.随着沉积激光能量的增大,薄膜厚度增加,表面颗粒尺寸明显增大,在可见光区的平均透射率下降.室温光致发光谱发现,CuAlO2薄膜在350nm附近有一个自由激子复合发光峰,说明在CuAlO2宽带隙半导体中存在直接带间跃迁,这对于该材料在光电子领域如发光二极管的应用具有重要意义.

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材料期刊网

沉积激光能量对CuAlO2薄膜光学性质的影响

Effect of Deposition Laser Energy on the Optical Properties of CuAlO2 Films

参考文献