以单晶si (100)为基底,采用无机溶胶-凝胶法在其表面制备W-Mo复合离子掺杂VO2薄膜.采用SEM、XRD等手段分析了薄膜的表面形貌和晶体结构.在热驱动下,利用原位FTIR分析了W-Mo复合离子掺杂VO2薄膜半导体-金属相变性能.结果显示:单晶Si (100)表面VO2薄膜具有(011)择优生长取向,W6+、Mo6+取代了V4+在晶格中的位置,实现置换掺杂.热滞回线分析表明,与未掺杂VO2薄膜相比,V1-x-yMoxWyO2薄膜相变温度降低,滞后温宽减小,同时相变陡然性变差,相变温宽增大;在相变温度区间内,温度路径对红外透过率具有调制效果,其调制作用受原始热滞回线的制约.
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