采用SiO2水溶胶(ACS)为硅源， H3PO4为桥联剂， H2O2为活化剂在玻璃表面成功制备了一种性能优异的新型减反膜。利用FTIR、XRD、FESEM、TEM、AFM对薄膜结构、形成机理及性能进行了研究，结果表明，在成胶过程中， H2O2的导入有效修复了SiO2胶粒的表面羟基，提高了SiO2的反应活性；而在焙烧过程中， H3PO4通过其自身脱水形成的偏磷酸链状体分别与 SiO2胶粒及玻璃基底表面的 Si-OH 进行了脱羟基缩聚，构架了坚固的Si-O-P网络交联，最终形成了稳定的磷硅酸盐凝胶网络结构，提高了成膜质量。当n(H3PO4)：n(H2O2)：n(EtOH)：n(SiO2)=0.49：0.52：30：1时，制备的SiO2减反膜在可见光区平均透光率高达98%，硬度可达6H。
An antireflective (AR) film was successfully prepared by dip-coating on silica glass substrate. During the preparation, aqueous colloidal silica (ACS) was used as silica source, orthophosphoric acid as adhesion pro-moting agent and hydrogen peroxide as activating agent. The structure, formation mechanism and performance of the film were investigated by FTIR, XRD, FESEM, TEM and AFM. The hydrogen peroxide in silica sol repairs the surface Si-O-bonds of colloidal silica particles greatly. As a result, their stabilities and reaction activities are improved. During the heat-treatment of the film, the orthophosphoric acid is firstly transformed into the chain of metaphosphoric acid and subsequently reacted with surface Si-OH from colloidal silica particles and the sub-strate, resulting in the formation of the numerous Si-O-P cross-linkings and the stable silicophosphate gel structure. When molar ratio of H3PO4: H2O2: EtOH: SiO2 is 0.49: 0.52: 30: 1, the average transmittance of the film in the visible light is 98%, and the pencil hardness grade reaches 6H.
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