在碱性催化条件下,以正硅酸乙酯为前驱体，制备了一种新的、光谱性能持效的短波长减反膜。溶胶制备中，采用20氟基-1,12-十二醇（PFG）控制了二氧化硅颗粒的结构和尺寸，从而一定程度地减小了薄膜的折射率。以PFG修饰的二氧化硅为基础，再采用甲基丙烯酸六氟丁酯的聚合物(PHFBMA)对溶胶进行改性，得到了适用于熔石英基底的PHFBMA/PFG/SiO2减反膜。该改性减反膜在300 nm左右可以达到99.9%的透过率，并且一定湿度条件下和含有机污染物的真空腔室内的考察结果表明，该改性膜层的透过率稳定性获得了显著提升。
A new silica shortwave-band antireflective (AR) coating with durable optical performance on fused silica substrate was prepared by a base-catalyzed Sol-Gel process using tetraethyl orthosilicate (TEOS) as a precursor. 1H, 1H, 12H, 12H-perfluoro-dodecane-1, 12-diol (simplified as PFG) was used to control the structure and size of the sil-ica particles in the sols, and hence decreased the refractive indices of the coatings. After Poly (2, 2, 3, 4, 4, 4-hexafluorobutyl) methacrylate (PHFBMA) being introduced into the silica sols, the AR coatings could retain a transmission about 99.9%at about 300 nm. At the same time, the transmission stability of the coatings was improved significantly, which were tested in a moisture environment and an organic-containing vacuum chamber, respectively.
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