采用电化学聚合法合成了对氯霉素(CAP)有快速响应和高灵敏度的聚苯胺/聚吡咯分子印迹复合膜修饰电极.通过微分脉冲伏安法、扫描电子显微镜对制备的分子印迹复合膜的电化学性质及表面形貌进行了表征.结果表明,以铁氰化钾为电化学探针,该膜对CAP的测定电化学信号响应快速、灵敏度高、选择性和膜再生性能良好.对CAP检测的线性范围为5.00×10-8~1.05×10-6mol/L,检测限为2.09×10-9 mol/L.
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