考察了4种含有不同N位取代基的对称吲哚方酸菁染料在阳离子表面活性剂十六烷基三甲基溴化铵(CTAB)、阴离子表面活性剂十二烷基硫酸钠(SDS)和非离子表面活性剂曲拉通(TX-100)水溶液中的光降解行为,结果表明.表面活性剂对染料分子具有保护作用,其影响大小为CTAB＞TX-100＞SDS,分子中有羧基的染料受影响程度最大.在表面活性剂浓度较低时,染料光降解程度随着表面活性剂浓度的增加而增加,但形成胶束后,染料的光降解程度则随着表面活性剂浓度的升高而降低.
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