考察了碱金属K修饰的SiO2负载极低含量过渡金属的高分散隔离活性位系列催化剂(K-M/SiO2(n(K)∶n(M)∶n(Si)=10∶1∶1000),M=V,Cr,Mn,Fe,Co,Ni,Cu,Zn)的丙烷选择氧化催化性能,并运用UV-Raman和CO2-TPD等方法,对该系列催化剂进行了结构和物化性能表征,探讨了催化剂的表面离子结构与催化反应性能之间的关系.发现钾修饰的SiO2负载过渡金属高分散隔离活性位催化剂上过渡金属离子的组态结构,对丙烷选择氧化反应性能有重要影响.相对稳定的全充满或无d电子的表面离子结构有利于选择氧化反应进行,而存在多种价态的相对不稳定的离子结构有利于深度氧化的进行.这一离子结构与丙烷选择氧化催化性能的关系与前期乙烷选择氧化规律相似,进一步说明在高分散隔离活性位催化剂中,过渡金属离子的电子组态结构是影响低碳烷烃选择氧化反应性能的最重要因素.
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