193nm ArF准分子激光光刻技术已广泛应用于90 nm以下节点半导体量产.分析了近期发展用于改进准分子激光性能的关键技术:主振-功率再生放大(MOPRA)结构,主振-功率振荡(MOPO)结构,主动光谱带宽稳定技术,先进的气体管理技术.对光刻用准分子激光光源技术发展趋势进行了简要的讨论.
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