通过在微弧氧化电解液中添加纳米SiO2颗粒配制纳米电解液,在铝合金表面制备了纳米复合微弧氧化层,考察了恒电压和恒电流两种模式下纳米SiO2复合对微弧氧化层生长动力学的影响.结果表明,恒电压模式下,纳米SiO2复合大幅度提高了生长电流和微弧氧化层生长速率；恒电流模式下,纳米SiO2复合提高了微弧氧化层生长速率,电流效率提高.纳米SiO2颗粒在纳米复合微弧氧化层中掺杂,形成杂质能级,并且降低了微弧氧化层材料的禁带宽度,促进了微弧氧化电击穿过程,是纳米SiO2复合促进微弧氧化层生长的主要原因.
参考文献
| [1] | 王丽.浅论铝及铝合金的表面处理技术[J].广西轻工业,2009(08):29-30,32. |
| [2] | Tillous, EK;Toll-Duchanoy, T;Bauer-Grosse, E .Microstructure and 3D microtomographic characterization of porosity of MAO surface layers formed on aluminium and 2214-T6 alloy[J].Surface & Coatings Technology,2009(13):1850-1855. |
| [3] | JIN Fan-ya;WANG Ke;ZHU Ming et al.Infrared Reflection by Alumina Films Produced on Aluminum Alloy by Plasma Electrolytic Oxidation[J].Materials Chemistry and Physics,2009,114:398-401. |
| [4] | 薛文斌,华铭,杜建成,田华,施修龄.LC4超硬铝微弧氧化膜的生长及表征[J].航空材料学报,2008(02):34-38. |
| [5] | 索相波,马世宁,邱骥,吕庆星.纳米SiO_2复合处理对7A52铝合金微弧氧化陶瓷层孔隙率及性能的影响[J].航空材料学报,2009(06):66-69. |
| [6] | 索相波;邱骥;刘吉延.7A52铝合金表面制备纳米颗粒复合陶瓷涂层研究[A].,2008 |
| [7] | MA Shi-ning;SUO Xiang-bo;JI Qiu .Fabrication of n-SiO2 reinforced Al2O3 composites coatings on 7A52 aluminum alloy by micro-arc oxidation[J].Current Advances in Materials and Processes,2010,97 - 101:1463-1466. |
| [8] | IKONOPISOV S;ANDREEVA L .Anodization of molybdenum in glycol-borate electrolyte-A peculiar kinetics of insulating film formation[J].Journal of the Electrochemical Society,1973,120(10):1361-1368. |
| [9] | IKONOPISOV S .Theory of electrical breakdown during formation of barrier anodic films[J].J Electrochim Acts,1977,22(10):1077-1082. |
| [10] | 裴素华.半导体物理与器件[M].北京:机械工业出版社,2008:9-20. |
| [11] | 蒋平;徐至中.固体物理简明教程[M].上海:复旦大学出版社,2000 |
| [12] | ALBELLA J M;MONTERO I.Electron injection sand avalanche during the anoxic oxidation of titanium[J].Journal of the Electrochemical Society,1984(131):1101-1104. |
| [13] | 王立模.本征击穿电场与禁带宽度的关系[J].微电子学,2006(06):702-706. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%