欢迎登录材料期刊网

材料期刊网

高级检索

采用 LEC 工艺,通过特殊的过滤措施,可以批量拉制重掺碲的 GaSb 单晶材料.计算结果表明,在该生长系统及工艺条件下,碲在 GaSb 中的有效分凝系数约为0.38.GaSb 单晶 EPD 测试表明:EPD 沿径向分布呈"W"型,数量约为1×103cm-2;沿晶体生长方向(100)变化不大.

参考文献

[1] Astles M;Hill A;Williams A J et al.[J].Journal of Electronic Materials,1986,15:41.
[2] Tran Dc et al.[J].IEEE Journal of Lightwave Technology,1984,LT-2:536.
[3] Levi A et al.[J].Applied Physics Letters,1987,51(13):984.
[4] Frass L M.5th Inter.Photovol.Sci.Eng[C].Kyoto,1990
[5] Stepanek B;Sestakova V .[J].Thermochimica Acta,1992,209:285.
[6] Vander Meulen Y J .[J].Journal of Physics and Chemistry of Solids,1961,28:25.
[7] Allred W P;Willardson R.K;Goering H.L.Compound Semiconducctors[M].New York,1962:187.
[8] Sunder W A;Barns R L et al.[J].Journal of Crystal Growth,1986,78:9.
[9] Ohmori Y;Sugiietal K .[J].Journal of Crystal Growth,1982,60:79.
[10] Miyazawa S et al.[J].Journal of Crystal Growth,1980,49:670.
[11] Sestakova V et al.[J].Thermochimica Acta,1992,198:213.
[12] Chin A K et al.[J].Applied Physics Letters,1982,40:248.
[13] Mullin J B;Willarclson R K;Goering H L.Compound Semiconductors[M].Reinhold,New York,1962
[14] Doerschel J et al.[J].Journal of Crystal Growth,1992,121:781.
[15] Quang N V et al.[J].Japanese Journal of Applied Physics,1981,20:817.
[16] Allred W P et al.[J].Journal of the Electrochemical Society,1961,108:258.
[17] Kumagawa M et al.[J].Journal of Crystal Growth,1977,41:245.
[18] Katsui A et al.[J].Japanese Journal of Applied Physics,1980,19:318.
[19] Cockayme B et al.[J].Journal of Crystal Growth,1982,56:267.
[20] Moravec F et al.[J].Crystal Research and Technology,1989,24:275.
[21] Hurle D T J;Hartmanp P.Crystal Growth :An introduction[M].North-Holland,Amsterdam,1973:225.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%