采用射频磁控溅射法在7059玻璃衬底上低温制备出Zn-Sn-O透明导电薄膜.制备薄膜为非晶结构,并且具有很好的稳定性,与玻璃衬底具有良好的附着性.薄膜主要是依靠膜中的氧空位导电,薄膜的电阻率强烈地依赖溅射气体中的氧分压.制备薄膜的最低电阻率为2.27×10-3 Ω·cm,在可见光范围内的平均透过率达超过90%.
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