溅射法镀二氧化钛薄膜靶材及工艺研究进展

稀有金属, 2006, 30(2): 177-180. doi: 10.3969/j.issn.0258-7076.2006.02.012

溅射法镀二氧化钛薄膜靶材及工艺研究进展

赵鑫 ^1, , 王星明 ^2, , 黄松涛 ^3, , 储茂友 ^4, , 郭奋 ^5, , 王赞海 ^6,

1.北京有色金属研究总院矿物资源与冶金材料研究所,北京,100088;北京化工大学教育部超重力研究中心,北京,100029

2.北京有色金属研究总院矿物资源与冶金材料研究所,北京,100088

3.北京有色金属研究总院矿物资源与冶金材料研究所,北京,100088

4.北京有色金属研究总院矿物资源与冶金材料研究所,北京,100088

5.北京化工大学教育部超重力研究中心,北京,100029

6.北京有色金属研究总院矿物资源与冶金材料研究所,北京,100088;北京化工大学教育部超重力研究中心,北京,100029

基金项目: 国家科技攻关项目(2003AA327040)

关键词：溅射 , 靶材 , 二氧化钛薄膜

Advances in Research on Sputtering Targets and Techniques Using Sputtering Preparation of Titania Thin Film

介绍了溅射法镀膜的基本原理,阐述了溅射法镀二氧化钛薄膜用靶材及相应溅射镀膜工艺的研究现状.溅射镀TiO2薄膜用靶材主要有金属钛、二氧化钛和"非化学计量"二氧化钛靶材3大类.由于钛的氧化态及靶材导电性不同,它们对溅射工艺(如溅射气氛等)有一定具体的要求,通过对靶材和相应工艺进行分析比较,指出应用"非化学计量"靶材是溅射法制备二氧化钛薄膜技术发展的重要方向.

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材料期刊网

溅射法镀二氧化钛薄膜靶材及工艺研究进展

Advances in Research on Sputtering Targets and Techniques Using Sputtering Preparation of Titania Thin Film

参考文献