利用多弧离子镀和选择腐蚀相结合的技术在Si(111)衬底上首次制备了具有择优取向的铬基金属衬底,该金属衬底具有与外延级硅衬底一致的表面粗糙度及平整度.采用SEM,EDX,XRD和显微硬度计对铬基金属衬底进行了表征.研究表明:镍铬共镀有利于获得(110)择优取向的铬基金属衬底,同时镍铬共镀对表面形貌、显微硬度、平整度均存在一定影响.
参考文献
| [1] | Groner M D;Elam J W;Fabreguette F H;George S M .Electrical characterization of Al2O3 films grown by atomic layer deposition on silicon and various metal substrate[J].Thin Solid Films,2002,413(1-2):186. |
| [2] | XIONG Chuanbing,JIANG Fengyi,FANG Wenqing,WANG Li,LIU Hechu,MO Chunnan.Different properties of GaN-based LED grown on Si(111) and transferred onto new substrate[J].中国科学E辑（英文版）,2006(03):313-321. |
| [3] | Xiong Chuanbing;Jiang Fengyi;Fang Wenqing;Wang Li Mo Chunna Liu Hechu .The characteristics of GaN-based blue LED on Si substrate[J].Journal of Luminescence,2007,122-123:185. |
| [4] | 熊传兵,方文卿,蒲勇,戴江南,王立,莫春兰,江风益.衬底温度对常压MOCVD生长的ZnO单晶膜的性能影响[J].半导体学报,2004(12):1628-1633. |
| [5] | 王志海,孙墨汉,王希囡,张钧.多弧离子镀合金涂层的成分控制及阴极靶源的成分设计[J].真空,2001(01):12-14. |
| [6] | 吴自勤;王兵.薄膜生长[M].北京:科学出版社,2001:213. |
| [7] | Miller RA.;Holland HJ. .CRYSTALLOGRAPHIC ORIENTATION OF SPUTTERED CR FILMS ON GLASS AND GLASS-CERAMIC SUBSTRATES[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):182-186. |
| [8] | Feng Y C;Laughlin D E .Formation of crystallographic texture in rf sputter-deposited Cr thin films[J].Journal of Applied Physics,1994,76(11):7311. |
| [9] | Balu R;Raju AR;Lakshminarayanan V;Mohan S .Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2005(1):7-12. |
| [10] | 黄胜涛.固体X射线学[M].北京:高等教育出版社,1985:308. |
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