用磁控共溅射法制备Cu-W合金薄膜,运用EDX,XRD,TEM,SEM和纳米压痕仪对薄膜成分、结构和力学性能及其关系进行了研究.结果表明,含W较低的Cu_(82.1)W_(17.9)(%,原子分数)和W浓度较高的Cu_(39.8)W_(60.2)薄膜为晶态结构且出现固溶度扩展,分别存在fcc Cu(W)亚稳过饱和固溶体(固溶度4.8%W)和bcc W(Cu)亚稳过饱和固溶体(固溶度5.7%Cu),W含量为31.8%,45.7%,54.8%的Cu-W薄膜呈非晶态,表面粗糙度较晶态Cu-W薄膜低.总体上非晶Cu-W薄膜弹性模量E和硬度H值较低,fcc Cu-W膜实测E值介于Voigt和Reuss规则预测值之间,bcc和非晶Cu-W膜实测E值分别高于和低于预测值;晶态Cu-W膜实测H值与Voigt规则计算值的符合性优于非晶膜,薄膜结构对力学性能预测可靠性影响较大.
The composition,structure,mechanical properties of Cu-W alloy thin films fabricated by magnetron co-sputtering were investigated by EDX,XRD,TEM,SEM and nanoindenter.The results showed that Cu_(82.1)W_(17.9)(%,atom fraction)with lower W content and Cu_(39.8)W_(60.2) with higher W concentration thin films were of crystalline state with the presence of fcc Cu(W)metastable supersaturated solid solution with maximum W solubility of 4.8%and bcc W(Cu)metastable supersaturated solid solution with maximum Cu solubility of 5.7%,respectively.Cu-W thin films with W of 31.8%,45.7%,54.8%were amorphous and exhibited lower surface roughness than crystalline Cu-W thin films.Generally,the values of hardness H and elastic modulus E of amorphous Cu-W thin films were lower than their crystalline counterparts.The measured E value of fcc Cu-W films ranged in values predicted by Voigt and Reuss rule,for bcc and amorphous Cu-W films the measured E values were higher and lower than the predicted Values respectively.The compliance of measured H values of crystalline Cu-W films and values calculated by Voigt rule Was better than amorphous Cu-W films.The estimation credibility of mechanical properties by rule-of-mixture was significantly influenced by the structure of Cu-W thin films.
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