研究了贵金属Ag修饰对新型半导体BiOCl薄膜材料光催化性能的影响.采用溶胶-凝胶浸渍提拉法先在ITO玻璃上制备了BiOCl薄膜.以其为基底用磁控溅射方法沉积少量的Ag制备Ag/BiOCl复合纳米薄膜.分别研究了不同沉积时间和溅射气压,以及后处理温度下获得的Ag/BiOCl薄膜对罗丹明B(Rh B)染料在紫外光下的光催化降解活性.结果发现适量的Ag修饰能够提高BiOCl薄膜的光催化活性.通过实验探索,当制备金属Ag的优化参数为溅射压强1 Pa,溅射时间1 s,后处理温度200℃,时间1h时获得的Ag/BiOCl复合纳米薄膜具有最好的光催化性能.用XRD,SEM,UV-Vis光谱等测试方法对其结构、形貌、光谱吸收性等进行了测量分析.进一步探讨了适量贵金属沉积对BiOCl薄膜光催化活性提高的可能原因,杂质能级形成的肖特基势垒对电子有捕获陷阱作用从而增加电子-空穴对的分离,同时利于光生载流子的重新分布.
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