用原子力显微镜研究了干燥环境下氧化硼基体上硼酸膜的生长情况,分析了硼酸膜的纳米摩擦磨损性能.试验表明,原子力显微镜探针能够使硼酸覆盖膜产生磨损,但对氧化硼几乎不起作用;在纳米尺度的接触下,硼酸膜并不一定能显示出低的摩擦特性,只有当表面层发生变形、移动和堆积后,才能使摩擦力显著下降.
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