用离子束溅射沉积和高能离子束辅助沉积方法制备了具有择尤性的钛纳米薄膜,并采用原子力显微镜、X射线衍射仪和俄歇电子谱仪研究了试样表面预处理、离子束流和温度等离子束工艺参数对钛薄膜结构的影响.结果表明:离子束溅射沉积的钛膜在[002]和[102]晶向上呈现出明显的择尤生长现象,并分别在该两个晶向上表现出纳米晶型和非纳米晶型结构;当用高能离子束辅助沉积时,[102]晶向择尤生长现象消失,且钛膜的结构对束流变化较为敏感,束流较低时,钛膜为纳米结构且择尤生长现象减弱,而束流增加时晶粒长大,择尤生长现象又增强.另外钛膜容易受到氧的污染,并随辅助离子强度增加而增强.
参考文献
| [1] | 张立德;牟季美.纳米材料和纳米结构[M].北京:科学出版社,2001 |
| [2] | 潘建跃,陶自春,罗启富.纳米级镀铂的钛阳极研究[J].机械工程材料,2003(12):23-25. |
| [3] | Samsonov V M;Muravyev S D;Dronnikov V V .Computer simulation of evolution nanometric micropartices in the field of the solid-vacuum interface[J].Vacuum,2001,61:339-344. |
| [4] | Mohan S.;Krishna MG. .A REVIEW OF ION BEAM ASSISTED DEPOSITION OF OPTICAL THIN FILMS [Review][J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,1995(7):645-659. |
| [5] | Dubrovskii V G;Cirlin G E;Baurnan D A et al.Kinetic model for a spontaneous islanding during ultra-high vacuum deposition[J].Vacuum,1997,50(1,2):187-190. |
| [6] | Templier C;Muzard S;Galdikas et al.A phenomenological study of the intial stages of film growth[J].Surface and Coatings Technology,2000,125:129-133. |
| [7] | Durand H A;Sekine K;Etoh K et al.Influence of ion induced surface defects on the nucleation and formation mechanisms of metallic thin film[J].Surface and Coatings Technology,2000,125:111-115. |
| [8] | 赵越,刘实,汪伟,郝万立,王隆保,李依依.纳米晶钛薄膜的制备及结构分析[J].原子能科学技术,2002(04):380-383,424. |
| [9] | 韩修训,阎逢元,阎鹏勋,刘维民.多层涂层的摩擦学研究进展[J].机械工程材料,2002(05):1-5,41. |
| [10] | 丛秋滋.多晶二维X射线衍射[M].北京:科学出版社,1997 |
| [11] | GunasekharK R;Srinivasulu S;Swarnalatha M et al.Structure and microstructure of ion-plated titanium films[J].Thin Solid Films,1994,252:7-12. |
| [12] | 刘金生.离子束沉积薄膜技术及应用[M].北京:国防工业出版社,2003 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%