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分别以粉末钛、硅、石墨和钛、碳化硅、石墨为原料,采用反应烧结工艺制备Ti3SiC2材料.结果表明:当以钛、硅、石墨单质粉料为原料时,在1200~1400℃温度范围内能够合成出高纯度的Ti3SiC2块体材料,且其纯度随着硅含量的增加而提高;当原料摩尔比为3:1.3:2和3:1.4:2时,该材料中只有Ti3SiC2相而无其他相存在;而以钛、碳化硅、石墨粉末为原料时,在1200~1400℃温度范围内很难合成出高纯度的Ti3SiC2块体材料.

参考文献

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[2] 朱教群,梅炳初,陈艳林.放电等离子烧结工艺合成Ti3SiC2的研究[J].硅酸盐学报,2002(05):649-652.
[3] Sun Zhimei;Zhang Yi;Zhou Yanchun .Synthesis of Ti3SiC2 powers by a solid-liquid reaction process[J].Scaipta Materalia,1999,41(01):61-66.
[4] Barsoum MW.;Elraghy T. .SYNTHESIS AND CHARACTERIZATION OF A REMARKABLE CERAMIC - TI3SIC2[J].Journal of the American Ceramic Society,1996(7):1953-1956.
[5] Y. Zhang;Y. C. Zhou;Y. Y. Li .Solid-liquid synthesis of Ti_3SiC_2 particulate by fluctuation procedure[J].Scripta materialia,2003(3):249-253.
[6] Li J T;Miyamoto Y .Fabrication of monolithic Ti3SiC2 ceramic through reactive sintering of Ti/Si/2TiC[J].Journal of Materials Synthesis and Processing,1999,7(02):91-96.
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