3C-SiC因其优越的物理和电学性能是制造耐高温、大功率、高频率器件的理想材料.本文报道了采用液相外延法从硅熔体中生长3C-SiC及抑制其相变的研究进展.采用X射线衍射、透射电镜、Raman散射等检测手段对样品进行结构分析,结果表明所制备的样品为3C-SiC单晶体.
参考文献
[1] | 陈治明;王建农.半导体器件的材料物理学基础[M].北京:科学出版社,1999 |
[2] | 郝跃;彭军;杨银堂.碳化硅宽禁带半导体技术[M].北京:科学出版社,2000 |
[3] | Tsvetkov V F;Allen S T;Kong H S 等.Recent Progress in SiC Crystal Growth[C].INSTITUTE OF PHYSICS CONFERENCE SERIES,1996,142:17-22. |
[4] | Vladimir Dmitriev.TTEC Panel on High-temperature Electronics in Europe[M].International Technology Research Institute Loyola College in Maryland,2000 |
[5] | Yakimova R;TuominenM;BakinAS;FornallJO, Vehanen A, Janzen E.Silicon Carbide Liquid Phase Epitaxy in the Si-Sc-C System[M].Kyoto ICSCRM:101-104. |
[6] | Fissel A .Relationship between Growth Conditions, Thermodynamic Properties and Crystal Structure of SiC[J].International Journal of Inorganic Materials,2001,3:1273-1275. |
[7] | Fissel A. .Thermodynamic considerations of the epitaxial growth of SiC polytypes[J].Journal of Crystal Growth,2000(3/4):438-450. |
[8] | HatayamaT;Nakamura S;Kurobe K 等.High-temperature Surface Structure Transitions and Growth of α-SiC(0001) in Ultrahigh Vacuum[J].Materials Science and Engineering,1999,B61-62:135-138. |
[9] | 马剑平,卢刚,雷天民,陈治明.硅熔体中3C-SiC的生长及6H-SiC晶型的抑制[J].半导体学报,2001(06):751-754. |
[10] | 孟庆昌.透射电子显微学[M].哈尔滨:哈尔滨工业大学出版社,1998 |
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