随着InGaP2/InGaAs/Ge三结太阳电池技术日趋成熟,具有更高理论效率的基于GaAs体系的四结电池新材料AlInGaP/InGaAs/?(新材料)/Ge已经受到人们的关注,经过计算,要求新材料的禁带宽度应该为0.95eV～1.05eV.InxGa1-xAs1-xNy材料的禁带宽度可以调整为0.95eV～1.05eV,是有望实现突破的材料.我们通过选取合适的生长方案,在D180MOCVD系统上外延生长了InxGa1-xAs1-yNy材料,并通过高分辨X光双晶衍射仪、分光光度计以及电化学电容-电压(EC-V)测试仪等对材料性能进行了分析.获得了室温下禁带宽度为1.17eV的InxGa1-xAs1-xNy材料.
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