沉积温度对LaNiO3薄膜结构和性能的影响

人工晶体学报, 2006, 35(2): 276-279. doi: 10.3969/j.issn.1000-985X.2006.02.016

沉积温度对LaNiO3薄膜结构和性能的影响

刘保亭 ^1, , 武德起 ^2, , 闫正 ^3, , 乔晓东 ^4, , 赵庆勋 ^5, , 王英龙 ^6,

1.河北大学物理科学与技术学院,保定,071002

2.河北大学物理科学与技术学院,保定,071002

3.河北大学物理科学与技术学院,保定,071002

4.河北大学物理科学与技术学院,保定,071002

5.河北大学物理科学与技术学院,保定,071002

6.河北大学物理科学与技术学院,保定,071002

基金项目: 中国科学院资助项目(50572021) 河北省自然科学基金(E2005000130) 河北大学校科研和校改项目(B0406030) 人事部留学回国人员科技活动择优基金

关键词： LaNiO3 , 外延薄膜 , 磁控溅射

Impacts of Deposition Temperature on the Structural and Physical Properties of LaNiO3 Films

采用磁控溅射法在(001)SrTiO3 基片上制备了LaNiO3氧化物薄膜,应用X射线衍射(XRD)、反射式高能电子衍射(RHEED)、原子力显微镜(AFM)、四探针测试仪等技术系统研究了沉积温度对LaNiO3薄膜结构和性能的影响.结果表明在较低的生长温度和较宽的温度范围内(250～400℃)都能得到外延LaNiO3薄膜.输运性质的测量结果表明在其它条件不变的情况下,250℃温度下生长的LaNiO3薄膜具有最高的电导率.

参考文献

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材料期刊网

沉积温度对LaNiO3薄膜结构和性能的影响

Impacts of Deposition Temperature on the Structural and Physical Properties of LaNiO3 Films

参考文献