分层沉积GaAs/SiO2纳米薄膜的结构和吸收光谱

人工晶体学报, 2006, 35(3): 630-634. doi: 10.3969/j.issn.1000-985X.2006.03.044

分层沉积GaAs/SiO2纳米薄膜的结构和吸收光谱

朱慧群 ^1, , 丁瑞钦 ^2, , 王忆 ^3, , 吴桐庆 ^4,

1.五邑大学薄膜与纳米材料研究所,江门,529020

2.五邑大学薄膜与纳米材料研究所,江门,529020

3.五邑大学薄膜与纳米材料研究所,江门,529020

4.华南理工大学物理科学与技术学院,广州,510641

基金项目: 广东省自然科学基金(04011770) 广东省江门市科技计划(江财企2003.61)

关键词：射频磁控溅射 , GaAs/SiO2纳米薄膜 , 氢掺杂 , 吸收光谱

Micro-structure and Absorption Spectra of Multi-layer Deposited GaAs/SiO2 Nano-films

应用射频磁控溅射方法分别在抛光硅片和石英玻璃片上分层沉积了GaAs/SiO2纳米薄膜.通过X射线衍射(XRD)、原子力显微镜(AFM)、扫描电子显微镜(SEM)及吸收光谱的测试,发现衬底温度、退火、氢掺杂等制备工艺对分层沉积的GaAs/SiO2纳米薄膜的微观结构和光学性质有明显的影响.本文对相关机理作了探讨.

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分层沉积GaAs/SiO2纳米薄膜的结构和吸收光谱

Micro-structure and Absorption Spectra of Multi-layer Deposited GaAs/SiO2 Nano-films

参考文献