用电子探针方法分析了在不同组织的碳钢基体上电沉积Ni-P合金的初期沉积行为.结果表明,Ni-P合金在渗碳体基体表面和晶界上优先沉积,沉积初期的镀层分布是不均匀的.消除镀层初期不均匀分布的有效途径是对基体组织进行均匀化处理.
参考文献
[1] | OsakaT .Metallization of A1N Ceramics by Electroless Ni - P Plating[J].Journal of the Electrochemical Society,1986,133(11):2345-2347. |
[2] | FlisJ;Duquette D J .Nucleation and Growth of Electroless Nickel Deposits on Molybdenum Activated with Palladium[J].ibid,1984,131(01):51-57. |
[3] | Sricharoenchaikitp .Thin Metal Film Formation Using Electroless Plating[J].ibid,1993,140:1917-1921. |
[4] | Severin J W .A Study on Changes in Surface Chemistry during the Initial Stages of Electroless Ni(P)Deposition on Alumina[J].ibid,1993,140:682-687. |
[5] | 于维平;段淑贞 .电沉积Ni-P非晶态合金的初期结构及其形成机理[J].材料研究学报,1996,10(04):419-422. |
[6] | Marton J P;Schlesinger M .The Nucleation Growth and Structure of Thin Ni- P Films[J].Journal of the Electrochemical Society,1968,115(01):16-21. |
[7] | Judge J S .Transmission Electron Microscopy Study of Electroless Ni-P and Cu Films at Initial Deposition Stage[J].ibid,1991,138:1269-1274. |
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