欢迎登录材料期刊网

材料期刊网

高级检索

介绍了介电材料表面金属化技术的发展概况.简述了原有化学镀工艺的缺点,着重介绍了近十余年来塑料电镀、PC板孔金属化、直接镀工艺三方面的发展:表面化学改性膜、碳胶膜、导电聚合物膜工艺.介绍了几种商品工艺.

参考文献

[1] Dietz K H .Review of "Diredt Peate” Processes & Assessment of the Impact on Primary Imaging of Printed Wiring Boards[J].Plating and Surface Finishing,1995,82(07):60-63.
[2] Wan Chi-Chao .A Review of the Technology Development of Direct Metallization[J].Proc Natl Sci Counc,1999,23(03):365-368.
[3] 石萍,李桂云.对印制板孔金属化直接电镀工艺的评价[J].电镀与精饰,1999(06):15-17.
[4] 蔡积庆 .印制板直接孔金属化电镀[J].电镀与环保,1994,14(04):8-10.
[5] Radovsky D A;Ronkese B J .Method of eletroplating on a dielecteic base[P].US:309608,1963.
[6] Bladon JJ.;Lytle FW.;Sonnenberg W.;Robinson JN.;Philipose G.;Lamola A. .A PALLADIUM SULFIDE CATALYST FOR ELECTROLYTIC PLATING[J].Journal of the Electrochemical Society,1996(4):1206-1213.
[7] Weng DC.;Landau U. .DIRECT ELECTROPLATING ON NONCONDUCTORS[J].Journal of the Electrochemical Society,1995(8):2598-2604.
[8] Yang CH.;Wan CC.;Chen CJ.;Wang YY. .A SEARCH FOR THE MECHANISM OF DIRECT COPPER PLATING VIA BRIDGING LIGANDS[J].Journal of the Electrochemical Society,1996(11):3521-3525.
[9] Chiang Y Y;Wang Y Y;Wan C C .Formation of PdS compounds in direct metallzation via Pd/Sn catalyst activation[J].Journal of the Electrochemical Society,1999,146(09):3255-3258.
[10] YANG C H;Wang Y Y;Wan C C .A kinctic study of direct copper plating via Pd catalyst and S ligand[J].Journal of the Electrochemical Society,1999,146(12):4473-4476.
[11] Meyer H R;Nichols R J;Schroer D et al.The use of conducting polymers and collosids in the through hole plating of printed circuit boards[J].Electrochimica Acta,1994,39:1325-1329.
[12] Morrissey D L;Takach P E;Zeblisky R J .Method for electroplating non-metallic Surfaces[P].US:4683036,1987.
[13] Bladon J J .Pretreatment for electroplating process[P].US 4895799,1990.
[14] [P].US 4919768,1990.
[15] [P].US Pat 5007900,1991.
[16] [P].US 5017742,1991.
[17] [P].US 5207888,1993.
[18] [P].US 5276290,1994.
[19] [P].US 4952286,1990.
[20] [P].US 5425873,1995.
[21] 陈亚,苗艺.塑料直接镀新工艺[J].材料保护,1997(09):15.
[22] 刘林青.直接电镀工艺控制[A].,2000:56.
[23] [P].JP Pat 10195691,1998.
[24] [P].WO 983959,1998.
[25] Seita H;Susaka M;Nawafune H et al.Direct Metallization on surface-modified polyimide resin[J].Plating and Surface Finishing,1996(83):59.
[26] Nawafune H;Kanai T;Miznmoto et al.Direct metallization using salfonation of thermosetting polyphenylene ether resin laminate[J].Plating and Surface Finishing,1997,84(07):52-54.
[27] 王丽丽.印制板直接电镀工艺[J].电镀与精饰,1998(06):10.
[28] 蔡积庆 .利用导电聚合物悬浮液的直接镀工[J].电镀与环保,1999,19(22):10.
[29] 刘光炳,湛虹.金属化的高分子薄膜制备与导电性能[J].材料保护,1998(06):3.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%