溅射非晶态薄膜磁性的控制

材料保护, 2004, 37(11): 35-37. doi: 10.3969/j.issn.1001-1560.2004.11.014

溅射非晶态薄膜磁性的控制

柳丽娜 ^1, , 高诚辉 ^2, , 李有希 ^3, , 李友遐 ^4,

1.福州大学机械工程及自动化学院,福建,福州,350002

2.福州大学机械工程及自动化学院,福建,福州,350002

3.福州大学机械工程及自动化学院,福建,福州,350002

4.福州大学机械工程及自动化学院,福建,福州,350002

关键词：非晶态薄膜 , 溅射 , 磁性

Magnetic Property Control of Sputtering Amorphous Film

微电子技术的迅速发展要求电子元件薄膜化,从而促进了磁性薄膜的发展.为了达到控制溅射非晶态薄膜磁性的目的,从溅射非晶态薄膜的组成成分、溅射工艺参数、基体材料及温度、膜层厚度和镀后热处理工艺等几方面论述了影响非晶态溅射薄膜磁性的因素,结果表明,薄膜组成、膜厚、基材、溅射工艺及镀后热处理对溅射非晶态薄膜的磁性有较大的影响,应根据不同磁性要求加以控制.

参考文献

[1]	WilliamsPI;Grundy P J.MagneticandMagnetostrictivePropertiesofAmorphousRareEarth-TransitionMetalAlloyFilms[J].Journal of Physics D:Applied Physics,1994(27):897-901.
[2]	ImamuraN;Mimura Y;Kobayashi T .Amorphous Gd-Fe Alloy Films Prepared by RF Cosputtering Technique[J].IEEE Transactions on Magnetics,1976,12(02):55-61.
[3]	严格;刘湘华;崔利亚等.高矫顽力SmCo/Cr薄膜的制备、结构及磁性[J].功能材料,1999,30(03):254255.
[4]	王翔,李佐宜,林更琪,蔡长波,胡雪涛,李震,LI Zhen.高矫顽力SmCo（Al，Si）／Cr薄膜的研究[J].磁性材料及器件,2001(02):5-8.
[5]	Choe G.;Valanju A.P. .Magnetic properties of sequentially sputtered amorphous Fe-Ge thin films[J].IEEE Transactions on Magnetics,1996(5):4538-4540.
[6]	Pan G.;Spencer A.G. .Study of CoNbFe films deposited by DC magnetron sputtering[J].IEEE Transactions on Magnetics,1991(1):664-668.
[7]	Banerjee R.;Choe G. .The structure and magnetic properties of sputtered, amorphous CoFeSiB thin films[J].IEEE Transactions on Magnetics,1995(6):3856-3858.
[8]	Zhang S.Y.;Shan Z.S. .High coercivity SmFeSiC films fabricated by multilayer sputtering[J].IEEE Transactions on Magnetics,1996(5):4550-4552.
[9]	马斌,沈德芳,狄国庆,杨正,魏福林.制备条件对Fe-Ta-N薄膜的结构和软磁性能的影响[J].磁性材料及器件,2001(02):1-4,8.
[10]	Jin S.;Tiefel TH.;Korenivski V.;Vandover RB.;Chen LH.;Zhu W. .FE-CR-N SOFT MAGNETIC THIN FILMS[J].Journal of Applied Physics,1997(8 Pt.2a):4042-4044.
[11]	ToshimaT;Tago A;Nishimura C .MagneticPropertiesofCoZrAmorphousFilmsPreparedbyLowEnergyIonBeamSputtering[J].IEEE Transactions Physics,1986,22(05):1110-1112.
[12]	HONDAS;Storer J .Magnetic Properties of Evaporated CoCr Films[J].IEEE Transactions on Magnetics,1986,22(05):337-339.
[13]	SunH;Tomida T .MagneticPropertiesandMicrostructureStudiesofSm-FeMagneticThinFilms[J].Journal of Applied Physics,1997,81(01):328-334.
[14]	SuzukiT;Shimada Y .SoftMagneticPropertiesofFe-B85-Nd15AmorphousFilms[J].IEEE Transactions on Magnetics,1986,22(05):1095-1097.
[15]	TagoA;Nishimura C;Yanagisawa K .MagneticPropertiesofIonBeamSputteredCo-ZrandCo-Zr-ReAmorphousFilms[J].IEEE Transactions on Magnetics,1985,21(05):2032-2034.
[16]	Zeltser A.M.;Jagielinski T.M. .Soft magnetic properties of FeXGaSi (X=Ir, Rh) films[J].IEEE Transactions on Magnetics,1993(6):3508-3510.

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

溅射非晶态薄膜磁性的控制

Magnetic Property Control of Sputtering Amorphous Film

参考文献