采用直流反应磁控溅射方法,在不同偏压条件下,在硬质合金基片(YG8 WC+8%Co)上沉积了氮化碳薄膜,并通过X光电子能谱仪、涂层附着力自动划痕仪和摩擦磨损试验机研究了CNx薄膜与基体的附着力及其摩擦学性能.结果表明,基片偏压对附着力和薄膜的摩擦学性能有一定的影响,在偏压为-100 V时沉积的CNx薄膜摩擦系数较小,具有良好的减摩作用,对硬质合金的附着力最好.
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