采用射频磁控溅射技术在柔性基体PI(聚酰亚胺)上制备了纳米CeO2-TiO2复合薄膜.借助X射线衍射(XRD)、原子力显微镜(AFM)和紫外-可见光谱仪分别研究了薄膜的物相结构、表面生长形貌和薄膜的紫外-可见光透过率及光学能隙,并用WS-2000型薄膜划痕仪测定薄膜与基体的界面结合强度.实验结果表明:沉积态的薄膜为非晶态,经200℃退火处理4h后,转化为良好的晶态,薄膜中主要含有锐钛矿相结构;溅射功率对薄膜的形貌,光学性能及界面结合力均有影响.尤其当溅射功率为120W时,薄膜的综合性能最优;平均晶粒尺寸110nm,表面粗糙度为160nm,吸光率达80%,光学能隙Eg仅为(2.65±0.05)eV,划痕法测量涂层与基体的附着力为60N.
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