研究了化学镀Ni-Cu-P合金镀液组成及操作条件对镀层厚度及硬度的影响.筛选出了体系的最佳工艺条件,获得了82.391%Ni-10.298%P-5.297%Cu的合金镀层,其硬度在450~500HV之间.X射线衍射表明:Ni-Cu-P合金镀层在镀态下为非晶态结构,但镀层经400℃和600℃热处理后,其结晶区域有Ni3P、Cu3P等特征的衍射峰出现,表明镀层为晶态结构.此外,研究表明:镀层厚度随硫酸镍浓度、次亚磷酸钠浓度、镀液温度及pH值的升高而增加,随硫酸铜浓度、络合剂浓度的升高而降低.
参考文献
[1] | Hur K H;Jeong J H;Lee D N .Effect of annealing on maggitic properties and macrostructure of electroless Ni-Cu-P alloy deposits[J].Materials Science,1991,26:2037-2044. |
[2] | Yan Wen;Chang Genxiao;Zhong Gangdeng .Structure and corrosion resistance of electroless Ni-Cu-P[J].Plating and Surface Finishing,1992,5:57-59. |
[3] | Hidemi Nawafune;Takashi Uegaki;Shozo Mizumoto;Masami Ishikawa;Tsuneshi Nakamura .Preparation and electrical resistance characteristics of electroless copper-nickel alloy deposits[J].Transactions of the Institute of Metal Finishing,1998(6):231-234. |
[4] | Wang Y W;XIAO C G;Deng Z G .Structure of corrosion resistance of electroless Ni-Cu-P[J].Plating and Surface Finishing,1992,79:57-59. |
[5] | 吴宜勇.化学镀Ni-Cu-P合金的热稳定性[J].材料保护,1995(09):6. |
[6] | Jones D A.Principles and prevention of corrosion[M].New York: Macllian Publishing Compony,1992 |
[7] | 王艳文.化学镀Ni-Cu-P合金层的组织结构及抗蚀性能研究[J].材料保护,1991(03):20. |
[8] | Chassaing E;Vu Quang K;Wiart R .Mechanism of copper-nickel electrodeposition[J].Journal of Applied Electrochemistry,1987,17:1267-1285. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%