综述了铟锡氧化物(ITO)薄膜的生产技术概况及其发展趋势.介绍了ITO薄膜的主要制备技术的制备原理,包括磁控溅射法、溶胶-凝胶法、化学气相沉淀法、喷雾热分解法及真空蒸发法等5种制膜工艺,并对其优缺点进行了分析.指出ITO薄膜生产技术的发展趋势为:1)大力开发溶胶-凝胶工艺;2)进一步深入研究其合成机理与性能;3)拓宽应用领域;4)开发先进的薄膜制备工艺技术.
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