介绍了近年来铜-钨(钼)薄膜涂层的制备方法.包括溅射沉积法、离子束辅助沉积法、离子束混合法、电子束蒸发法.重点介绍了溅射法中的磁控溅射法和离子束溅射沉积法,分析了薄膜的结构特征及其在固体润滑剂、电子设备、表面修饰材料等领域的应用,并展望了未来的研究方向和应用前景,指出制备散热材料是未来铜一钨(钼)薄膜研究的主流方向.
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