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  4. 原子层沉积前驱体材料的研究进展

表面技术 , 2010, 39(4): 77-82. doi: 10.3969/j.issn.1001-3660.2010.04.023

原子层沉积前驱体材料的研究进展

袁军平 1, , 李卫 2, , 郭文显 3,

1.暨南大学,理工学院,广州,510632;广州番禺职业技术学院,广州,511483

2.暨南大学,理工学院,广州,510632

3.暨南大学,理工学院,广州,510632

基金项目:   广州市教育局科研项目(08C013)   广州市教育系统首批建设创新学术团队项目(穗教科2009-11)  

关键词： 原子层沉积 , 前驱体 , 材料

The Research Progress of Precursors for Atomic Layer Deposition

介绍了原子层沉积技术的基本原理及其特点,从无机类材料和有机金属类材料两个方面综述了前驱体材料的研究进展状况,介绍了单一元素、卤化物等无机类前驱体材料的特点,以及炕基、环戊二烯基、醇盐、β二酮、烷基胺、硅胺基和酰胺等有机金属类前驱体材料的特点.结合原子层沉积过程的工艺特点和膜层要求,强调了在选择前驱体材料时,需要综合考虑材料的蒸汽压、反应性、化学稳定性、反应产物的活性、材料的安全性及来源等方面的因素.

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