利用X-射线光电子能谱对Ni-Mo沉积层表层中Ni、Mo的存在形式进行了分析,并对其表面进行了Ar+离子刻蚀深度分析.结果表明:Ar+离子未溅射时,沉积层中的Ni和Mo分别以Ni(OH)2和MoO3(或MoO2-4)形式存在:Ar+离子溅射3 min后,沉积层中的Ni和Mo分别以NiO和MoO2形式存在;Ar+离子溅射15 min后,沉积层中的Ni和Mo分别以单质Ni和单质Mo形式存在.
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