详细介绍了纳米材料的特性,制备方法,纳米金属多层膜的力学、电学、磁学、光学和电化学性能.讨论了巨磁阻多层膜研究进展及应用前景,介绍了金属多层膜微观结构的研究及表征方法.评述了纳米材料的发展趋势,提出了今后的研究方向.
参考文献
[1] | 严东生 .纳米材料的合成与制备[J].无机材料学报,1995,10(01):1-6. |
[2] | 李新勇,李树本.纳米半导体研究进展[J].化学进展,1996(03):231. |
[3] | 黄清安;王银平;张葵 等.电沉积法制备金属多层膜的述评[J].电镀与涂饰,1998,17(01):48-51. |
[4] | 游阳明.电沉积制备纳米迭层薄膜材料[J].电镀与精饰,1995(04):20. |
[5] | 喻敬贤;陈永言;黄清安 .纳米金属多层膜的电化学制备与性能研究的现状[J].材料保护,1997,30(07):1-4. |
[6] | 马洁;江琳才;蒋雄.纳米晶Ni-Mo合金复合镀层中钼含量对析氢反应的影响[A].厦门,1995 |
[7] | 喻敬贤 .纳米材料的电化学制备与性能研究[D].武汉:武汉大学化学系,1996. |
[8] | Yang CC.;Cheh HY. .PULSED ELECTRODEPOSITION OF COPPER/NICKEL MULTILAYERS ON A ROTATING DISK ELECTRODE .1. GALVANOSTATIC DEPOSITION[J].Journal of the Electrochemical Society,1995(9):3034-3040. |
[9] | Tench D M;White J T .Considerations in Electrodeposition of Compositonally Modulated Alloys[J].Journal of the Electrochemical Society,1990,137(10):3061-3066. |
[10] | Haseeb ASMA;Celis J P;Roos J R .Dual-Bath Electrodeposition of Cu/Ni Compositionally Modulated Multilayers[J].Journal of the Electrochemical Society,1994,141(01):230-237. |
[11] | Ross C A;Goldman L M;Spaepen F .An Electrodeposition Technique for Producing Multilayers of Nickel-Phosphorous and Other Alloys[J].Journal of the Electrochemical Society,1993,140(01):91-98. |
[12] | Menezes S;Anhclerson D P .Wavelength-property Correlation in Electrodeposited Ultrastructured Cu-Ni Multilayers[J].Journal of the Electrochemical Society,1990,137(02):440-444. |
[13] | Odgen C;Tench D;Whit J .Rotating Cylinder Method for Precise Tensile Testing of Electrodeposits[J].Plating and Surface Finishing,1980,67(12):50-54. |
[14] | Foecke T;Lashmore D S .Mechanical Behavior of Compositionally Modulated Alloys[J].Scripta Metallurgica et Materialia,1992,27:651-656. |
[15] | Hevaris N K;Logothetidis S .Optical Anisotropy in Compositionally Modulated Cu-Ni Films by Spectroscopic Ellipsometry[J].Applied Physics Letters,1987,50(22):1544-1546. |
[16] | Joseph Y;Zadok O .Formation of Composiiton Modulated Alloys by Electrodeposition[J].Journal of Materials Science,1987,22:499-503. |
[17] | Celis JP.;Callewaert K.;Vanhoutte P.;Vanacker K. .RESIDUAL STRESS MEASUREMENTS IN ELECTROLYTIC COPPER-NICKEL COMPOSITIONALLY MODULATED MULTILAYERS[J].Journal of the Electrochemical Society,1995(1):70-74. |
[18] | Lashmore D S;Dariel M P .Electrodeposited Cu-Ni Textured Superlattices[J].Journal of the Electrochemical Society,1988,135(05):1218-1221. |
[19] | Falicov L M.Metallic Magnetic Superlattices[J].Physics Today,1992(10):46-51. |
[20] | 柏原智;常光幸美;林安德 .电析によるPt/Co多层膜の作制[J].表面技术,1995,46(06):577-578. |
[21] | 常光幸美;柏原智;林安德 .电析による磁性Co/Pt多层膜の作制[J].表面技术,1993,44(12):1128-1133. |
[22] | Martin C R .Nanomaterials:A Membrane-Based Synthetic Approach[J].Science,1994,266(12):1961-1966. |
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