利用直流磁控反应溅射法在Al基底上制备了ZrN2及Ti多层薄膜。利用扫描俄歇微探针的深度剖析和线形分析技术研究了真空热处理对Ti/ZrN2/Al样品膜层之间的界面化学状态和相互作用的影响。研究结果表明，真空热处理使Ti/ZrN2/Al薄膜界面上发生了明显的界面扩散和化学反应，生成了TiNx物种，并且薄膜内层发生了严重的氧化反应。
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